Uniform laser direct writing for waveguides

ABSTRACT

A waveguide includes a segment with a substantially uniform cure profile and related methods and systems for making and using the same. The waveguide is formed by modifying a laser beam used to write the waveguide to provide a substantially uniform cure profile in the waveguide. A marker characteristic of laser writing may be present in the waveguide. A method or system modifies an intensity profile or a shape profile of a laser beam to proactively compensate for exposure convolution based on the characteristics of the laser beam spot profile. A convolution compensator is positioned in the path of the laser beam to modify the beam spot profile during writing to form the one or more segments of the waveguide in a photo-curable layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a divisional application of U.S. patentapplication Ser. No. 15/004,578, filed Jan. 22, 2016, entitled UNIFORMLASER DIRECT WRITING FOR WAVEGUIDES, which is incorporated entirelyherein by reference.

FIELD

The disclosure herein relates to optical waveguides and theirfabrication to reduce optical losses in an optical waveguide on aprinted circuit board.

SUMMARY

The present disclosure relates to a waveguide formed by modifying alaser beam to fabricate a uniform refractive index profile in an opticalpolymer waveguide formed by laser direct writing (LDW). The disclosurealso relates to a method and system for modifying the laser beam spotprofile used to trace and cure the waveguide to provide an accurate anduniform cure profile in the waveguide.

In at least one embodiment, a method includes tracing a waveguidesegment in a photo-curable layer with a laser beam. The laser beamdefines a non-uniform spot profile. The non-uniform spot profile has atleast one of a variable intensity profile and a variable width shapeprofile. The laser beam is passed through a convolution compensator tomodify at least a portion of the laser beam in response to at least oneof the variable intensity profile and the variable width shape profileof the non-uniform spot profile to define a modified beam portion of thelaser beam and a modified spot profile different than the spot profile.The photo-curable layer is cured along the waveguide segment with themodified beam portion of the laser beam having the modified spotprofile.

In another embodiment, a system includes an electromagnetic radiationsource to cure a waveguide by directing a laser beam. The laser beamdefines a non-uniform spot profile. The system further includes aconvolution compensator positioned to modify at least one of thevariable intensity profile and the variable width shape profile tocompensate for exposure convolution in a photo-curable layer when thelaser beam is directed at the photo-curable layer and translated along apath in a plane parallel to the photo-curable layer.

In a further embodiment, an apparatus includes a waveguide segmentdefining a segment width between segment sides, a height profile, and acure profile across the segment width. The height profile defines anon-uniform height portion adjacent at least one of the segment sides.The cure profile is a substantially uniform cure profile across thesegment width.

The above summary is not intended to describe each embodiment or everyimplementation of the present disclosure. A more complete understandingwill become apparent and appreciated by referring to the followingdetailed description and claims taken in conjunction with theaccompanying drawings. In other words, these and various other featuresand advantages will be apparent from a reading of the following detaileddescription.

BRIEF DESCRIPTION OF THE DRAWINGS

The disclosure may be more completely understood in consideration of thefollowing detailed description of various embodiments of the disclosurein connection with the accompanying drawings.

FIG. 1 is a schematic diagram of an exemplary waveguide laser directwriting system.

FIG. 2 is a schematic time-lapse representation of a process to form awaveguide.

FIGS. 3A and 3B are schematic diagrams of a laser beam with a uniformspot profile, an exemplary convolution compensator in position to modifythe beam, and related cross-sections.

FIG. 4 is a schematic time-lapse representation of an exemplary processto form a consistent waveguide with a symmetric cure profile using theexemplary convolution compensator of FIG. 3A and a uniform laser beamspot profile.

FIG. 5 is a schematic plan-view representation of an exemplary opticalboard including an exemplary waveguide.

FIG. 6 is a schematic cross-sectional elevation-view representation ofthe exemplary waveguide of FIG. 5.

FIG. 7 is a schematic time-lapse representation of an exemplary processto form a consistent waveguide with a symmetric cure profile using theexemplary convolution compensator of FIG. 3A and a non-uniform laserbeam spot profile.

FIGS. 8A and 8B are schematic diagrams of a uniform laser beam, anotherexemplary convolution compensator in position to modify the beam, andrelated cross-sections.

FIGS. 9A and 9B are schematic diagrams of a uniform laser beam, afurther exemplary convolution compensator in position to modify thebeam, and related cross-sections.

FIG. 10 is a schematic time-lapse representation of an exemplary processto form a consistent waveguide with a symmetric cure profile using theexemplary convolution compensator of FIG. 9A and a uniform laser beamspot profile.

FIGS. 11A, 11B, 11C, and 11D are schematic representations of exemplarybeam cross-sectional shapes.

DETAILED DESCRIPTION

Polymer based optical waveguides provide numerous desirable propertiesfor use in a multitude of electronic devices, including in someembodiments, data storage devices, network components, networkappliances, routers, hubs and other similar devices. These waveguidescan be formed on printed circuit boards (PCB), which, in turn, would bereferred to as optical PCBs, or more generally, as optical boards. Thesewaveguides and optical PCBs can function as a component or buildingblock of a larger structure or apparatus. Alternatively the waveguidesand optical PCBs can function on their own without any other relateddevices or structures. The waveguides and optical PCBs can be integratedand connected to other structures and different components as well as inorder to provide an assembly.

The disclosure herein relates to optical waveguide fabrication to reduceoptical losses in an optical waveguide on a printed circuit board. Thepresent disclosure relates to a waveguide formed by modifying a laserbeam to fabricate a uniform refractive index profile in an opticalpolymer waveguide formed by laser direct writing (LDW). The disclosurealso relates to a method and system for modifying the laser beam spotprofile used to trace and cure the waveguide to provide an accurate anduniform cure profile in the waveguide.

An illustrative waveguide LDW method modifies an intensity profile, ashape profile, or both of a laser beam spot profile to proactivelycompensate for exposure convolution based on the characteristics of thelaser beam spot profile. In many embodiments, the method utilizes aconvolution compensator positioned in the path of a laser beam to modifythe laser beam spot profile during tracing and curing steps to form awaveguide segment in a photo-curable layer. The convolution compensatoris operable to modify the intensity profile, the shape, or both of thespot profile based on the characteristics of the laser beam spot profilebeing used to trace and cure. In some embodiments, the convolutioncompensator includes a reconfigurable density filter, an adaptive lens,or any number of both. It is to be understood that the convolutioncompensator configurations described herein are merely exemplary, andother convolution compensator configurations having additional or fewercompensation elements in any similar equivalent) arrangement areconsidered by the present disclosure. While the present disclosure isnot so limited, an appreciation of various aspects of the disclosurewill be gained through a discussion provided below.

The methods described herein form a waveguide that more closely matchesa desired or target cure profile along one or more waveguide segments.In some embodiments, the waveguide cure profile is more consistent alongmultiple waveguide segments. For example, the waveguide cure profile ofa non-linear waveguide segment may be more consistent with, orsubstantially match, the waveguide cure profile of a proceeding orpreceding linear segment in the same waveguide. In additional oralternative embodiments, the waveguide cure profile more closely matchesa desired or target cure profile for all waveguide segments bycompensating for exposure convolution. For example, a non-linearwaveguide segment has a desirable symmetric waveguide profile instead ofan undesirable asymmetric profile. Although in other examples, anasymmetric waveguide profile may be desirable.

Recognizing that the cure profile of a waveguide influences therefractive index profile, that mismatches in refractive index profilesbetween consecutive segments can contribute to optical losses, and thatthe actual waveguide refractive index profile may differ from the targetrefractive index profile due to exposure convolution, the methodsdescribed herein facilitate the formation of consistent and moreaccurate cure profiles for a waveguide for linear waveguide segments,non-linear segments, and combinations thereof. This may result in anexemplary waveguide with less optical loss in use than a waveguideformed by other methods, systems, or apparatuses.

Examples to be described include a system with reference to FIGS. 1, 3A,3B, 8A, 8B, 9A and 9B, exemplary apparatus with reference to FIGS. 5 and6, exemplary methods with reference to FIGS. 2, 4, 7, and 10, andexemplary spot profiles with reference to FIGS. 11A, 11B, 11C, and 11D.It will be apparent to one skilled in the art that elements from oneembodiment may be used in combination with elements of the otherembodiments, and that the possible embodiments of such method, system,or apparatus using combinations of features set forth herein is notlimited to the specific embodiments shown in the figures and/ordescribed herein. Further, it will be recognized that the size and shapeof various elements herein may be modified but still fall within thescope of the present disclosure, although one or more shapes and/orsizes, or types of elements, may be advantageous over others.

Any channel, member, or other physical structure operable to guideelectromagnetic radiation and useful to carry an optical signal can be awaveguide. In some cases, a waveguide is formed of glass or a polymer.Glass waveguides can exhibit a practically limited bend radius and bedifficult to integrate into dense opto-electrical circuit boards. On theother hand, polymer waveguides may be integrated into high-densityopto-electrical printed circuit boards (e.g., PCBs). A polymer waveguidecan include a waveguide core layer that is optically transparentsurrounded by a cladding layer typically having a lower refractive indexthan the waveguide core layer. As used herein, the term “waveguide” mayrefer only to the structure corresponding to the waveguide core layer,which may be formed from a photo-curable material layer.

Any useful polymeric material can be utilized to form the polymericwaveguide. In many embodiments the polymer waveguide is formed of apolyacrylate, polynorbornene or polysiloxane material.

Waveguides may be designed as multimode or singlemode. A multimodewaveguide is a low cost option for integrating and coupling to embeddedoptical PCB channels. Singlemode waveguides enable ultra-low costphotonic integrated circuits, including silicon photonics, devicesassembled directly onto small form factor boards.

Singlemode waveguides typically have a smaller core size, or lateralwidth, than multimode waveguides and typically exhibit less modaldispersion over a distance. Illustrative waveguides have a lateral widthrange of about 1-100 micrometers. The cross-sectional shape may besquare, rectangular, half-dome, Gaussian-like, or another similar shape.In many embodiments, singlemode waveguides have a lateral width range ofabout 5-15 micrometers. In some embodiments, multimode waveguides have alateral width range of about 35-100 micrometers.

The photo-curable layer may define a surface, such as a planar surfaceof a PCB. In many cases, the PCB surface is not perfectly “flat” and mayinclude other features or variations without altering the general planarcharacter of the PCB or the generally planar path of any waveguideformed thereon.

In some cases, waveguides formed on a planar surface may include alinear segment, a non-linear segment, or any number thereof. For eachwavy guide, the segments may be arranged in series (e.g., adjacent to,contiguous with, or essentially continuous end-to-end). In someembodiments, the waveguide segments are formed according to a bendradius. A non-linear segment may be defined by one or more bend radii,as well as an arc angle (e.g., a right-angle turn being 90 degrees) anda length of the segment (including one or more arc lengths), to form anoverall shape of the non-linear segment on the planar surface. Anillustrative non-linear segment defined by one bend radius forms aportion of a circle along an arc angle, such as a quarter circle thatguides electromagnetic radiation around an arc angle of 90 degree bend.A linear segment may be considered to define a bend radius that isinfinite. Non-limiting examples of smaller bend radii include about 15mm, about 10 mm, about 5 min, or about 1 mm. Accordingly, larger bendradii may range anywhere from the smaller bend radii to less thaninfinity.

Although some embodiments of a non-linear segment are single bend radiussegments defined by a single bend radius along the length of the segmentto achieve an arc angle, many other embodiments are graded bend segmentsdefined by multiple incremental waveguide segments, each defining a bendradius incrementally changed from the bend radius of the previousincremental segment, to achieve the arc angle. In many embodiments, thegraded bend segment defines gradually increasing bend radii. Due tohaving multiple bend radii, a graded bend segment defines a non-circularcurve along its length. Non-limiting examples of graded bend segmentsinclude an oval section, an ellipse section, a parabola section, ahyperbola section, a sinusoidal section, an S-shape section, amongothers. In various embodiments, a non-linear segment is defined bymultiple bend radii to form a convex segment, a concave segment, orcombinations of both (e.g., an S shape).

Using a graded bend segment in a waveguide can improve optical lossesversus a single bend radius segment, because the maximum bend mismatchfrom segment-to-segment can be reduced. In one example, a single bendradius segment defines a single bend radius X to achieve an arc angleand maintains the bend radius along its length wherein ΔX is the changefrom the preceding segment's bend radius to X. On the other hand, inanother example, a graded bend segment defines the bend radius of thefirst incremental segment as Y¹ and defines an incremental arc anglefrom the preceding segment's bend radius to Y as ΔY₁, which is less thanΔX. In addition, ΔY₂, ΔY₃, . . . and ΔYn represent the bend radiuschanges between subsequent incremental segments, which are each lessthan ΔX. Due to the slower change in bend radius along the arc angle, insome embodiments, the graded bend segment has a longer length than thearc length of a single bend radius segment achieving the same arc angle.

In many embodiments, the arc length of each of the plurality ofincremental waveguide segments is a fraction of the total length of thegraded bend segment, which may be less than about 50%, less than about33.3%, less than about 25%, less than about 20%, less than about 10%,less than about 5%, or less than about 1%. The arc length of eachincremental segment may be the same or different. In one embodiment, thenumber of incremental segments, the arc length of each, the change inbend radius from segment-to-segment, or a combination thereof isselected to improve optical loss in the waveguide.

Polymer waveguides may be formed at least by photolithography or laserdirect writing (LDW). The photolithography process can form high-qualitywaveguides. However, the process requires high-resolution masks and canbe prohibitively expensive and time-intensive. On the other hand, an LDWprocess does not require masks and can be substantially faster thanphotolithography for producing waveguides depending on the design of thewaveguide layout. An illustrative LDW process for writing a waveguideincludes moving or translating an electromagnetic radiation source alonga path to trace and to cure selective portions of a photo-curablepolymer layer to form the waveguide core structure in the polymer corelayer.

Any energy source, with sufficient optical power and intensity for theappropriate wavelength(s) to cure the photo-curable polymer core layer,can be an electromagnetic radiation source for LDW. In many embodimentsthe electromagnetic radiation source provides a laser beam ofconcentrated or focused radiation. In some embodiments, the laser beamis an ultraviolet (UV) laser beam.

A laser beam may have a cross-sectional profile, which defines the spotprofile of the laser beam. The spot profile is defined as one or morecharacteristics of a cross-section of the laser beam incidence on asurface, such as that of the photo-curable layer or another object(e.g., convolution compensator). In some embodiments, thecross-sectional profile may be the same or similar as the spot profile(e.g., flat surface and perpendicular incidence). In many embodiments,the spot profile defines an intensity profile, a shape profile, or both,for example. In many embodiments, the shape profile of the laser beam isa circular and the intensity profile is uniform. The uniform intensityprofile of the spot profile may be achieved by directing a laser beam,which has a Gaussian intensity beam cross-sectional profile, through aspatial filter (e.g., a pin hole), which allows only the relativelyuniform center portion of the Gaussian intensity profile to pass through(i.e., forming a “top hat” profile). In other embodiments, the intensityprofile is Gaussian in response to a Gaussian intensity beamcross-sectional profile.

In some applications, a translator directs the beam from theelectromagnetic radiation source to trace and to cure the photo-curablelayer along a trace. In many embodiments, the translator moves thesource in a plane offset and parallel to the planar surface defined by aphoto-curable layer of a PCB to trace the waveguide geometry.

The translator may move the laser beam in one dimension parallel to theplane of the PCB to trace a linear waveguide segment (e.g., a waveguidesegment with an infinite bend radius). The translator may also move theelectromagnetic radiation source in two dimensions parallel to the planeof the PCB to trace a linear or non-linear waveguide segment. In manyembodiments, the translator rotates the laser beam in response to thedirection of translation to align the laser beam spot profile to thewaveguide segment being traced. For example, the laser beam may berotated continuously while tracing a continuous non-linear waveguidesegment. A non-limiting example of aligning the laser beam spot profileto the waveguide segment is rotating the laser beam to align therespective widths of the laser beam spot profile and the waveguidesegment as the orientation of the waveguide segment may rotate during atrace (e.g., a non-linear waveguide segment, a change in bend radius, ora change in translation direction in the plane).

The LDW process can provide comparable performance to photolithographyfor some waveguide segments depending on the waveguide geometry.However, a waveguide segment fabricated with an LDW process andincluding a finite bend radius can exhibit significantly decreasedperformance when compared to fabrication by photolithography due toexposure convolution inherent in the process.

Optical losses depend at least partially on the geometry of thewaveguide. For example, a waveguide having a bend radius at or near thecritical bend radius may experience substantial optical losses. Thecritical bend radius relates to the critical angle for an optical ray ofa signal transmitted through the waveguide along a propagationdirection. The critical bend radius for an optical ray describes aradius at or above which the conditions for total internal reflectionare satisfied and below which the waveguide may lose at least somesignal energy, resulting in optical losses. The bend radius of awaveguide segment influences the angle of incidence for at least someoptical rays of the signal. Depending on the critical angle, defined bythe difference in the index of refractions of the core and cladding atthe waveguide boundary, optical rays with an angle of incidence at orbelow the critical angle may satisfy the conditions for total internalreflection within the waveguide. On the other hand, angles above thecritical angle may expel the optical ray out of the waveguide boundary.Thus, the critical bend radius for a waveguide depends on the particulargeometry of the waveguide, such as the segment bend radius or the corewidth, which can affect optical losses.

Used herein, “convolution” expresses how the shape of one opticalfunction is modified by the other optical function by integration. Inone embodiment, a convolution expresses how the intensity distributionof a laser beam spot profile as applied to a photo-curable layer (thefirst optical function) is modified by the path of tracing a waveguidein the photo-curable layer over time (the second optical function) byintegration. In other words, the convolution of these functionsexpresses the total sum of energy that the waveguide in thephoto-curable layer is exposed to from the laser beam spot profile foreach point of the waveguide, along its width and length, as the laserbeam passes over the photo-curable layer to trace and cure thewaveguide. This particular convolution is an example of “exposureconvolution,” as used herein.

In some cases, exposure convolution can cause a waveguide with a linearand a non-linear segment to have uneven curing between the segments whenwritten by an LDW process. For example, when tracing the non-linearwaveguide segment having a finite bend radius, the photo-curable layeralong the trace receives uneven total amounts of energy from the laserbeam across its width. For example, an inner portion of the waveguidesegment receives more total energy than a central portion, whichreceives more total energy than an outer portion of the waveguide. Thisis because the laser beam passes more quickly over the outer portionthan the central portion, which passes more quickly over the centralportion than the inner portion. The total energy received across thewaveguide width will be different for the linear waveguide segment andthe non-linear waveguide segment, and thus the curing profiles will alsobe different.

The total energy can be determined by integrating the distribution ofthe laser beam, directed onto the photo-curable layer during the trace,along the curved path of the laser beam over the time required to writethe waveguide.

In various cases, exposure convolution can also cause a waveguide havingonly a linear waveguide segment or only a non-linear waveguide segmentto have non-uniform curing when written by an LDW process. In manyembodiments, a laser beam has a spot profile that is symmetric butvaries in width along the shape profile of the spot profile (e.g., acircle has a variable width shape profile), varies in intensity acrossthe waveguide width (e.g., a Gaussian beam spot has a variable intensityprofile across the width), or both. In such embodiments, a linearwaveguide segment being written will receive more total energy in theinner part of the waveguide width (e.g., central portion along thewaveguide width) than the outer part of the waveguide width (e.g., sideportions near the edges that flank the central portion). The result is asymmetric but uneven cure profile across the width of the waveguidesegment corresponding to the variable shape profile of the laser beamspot profile across the spot profile width. This effect would also applyto writing a non-linear waveguide segment, which may be furthercompounded by the uneven total energy between the inner portion and theouter portion relative to the bend of the non-linear waveguide segment,as described in the foregoing.

Uneven and non-uniform curing may result in uneven refractive indexprofiles, uneven waveguide cross-sections, or both, which may contributeto optical losses, particularly as the bend radius for a waveguidesegment approaches the critical bend radius. In some cases, the decreasein performance is exponentially proportional to the decrease in bendradius. A convolution compensator addresses the effect of exposureconvolution by modifying the laser beam used to form the waveguidesegment, which can improve cure profile accuracy and improve opticallosses.

FIG. 1 is a schematic diagram of an exemplary waveguide laser directwriting (LDW) system 10 capable of compensating for exposureconvolution. The LDW system 10 includes an electromagnetic radiationsource 12, which is traced along a path 14 relative to a photo-curablelayer 16, to provide energy to cure a portion of the photo-curable layerto form a waveguide. In the illustrated embodiment, the photo-curablelayer 16 has a planar surface for receiving energy from the source 12.The photo-curable layer 16 may be one layer of an optical PCB, whichalso has other layers, such as a lower and upper waveguide claddinglayer (e.g., FIG. 9).

A convolution compensator 18 is positioned in the path of a laser beam20 emitted from the source 12 and optionally modifies the laser beam tocompensate for exposure convolution. For example, the laser beam 20defines a spot profile 22, and when the laser beam 20 passes through theconvolution compensator 18, at least a portion of the laser beam ismodified to define a modified beam portion 23 of the laser beam and todefine a modified spot profile 24 different than the spot profile 22.

The spot profiles 22, 24 are two-dimensional cross-sections of the laserbeam 20 parallel to the surface of the photo-curable layer 16 in thearea wherein the photo-curable layer receives laser beam energy. In theillustrated embodiment, the spot profiles 22, 24 are also orthogonal tothe direction of beam propagation.

In various embodiments, the laser beam spot profile 22 is uniform inintensity distribution. In other embodiments, the laser beam spotprofile 22 of the electromagnetic radiation source 12 is not uniform inintensity. Non-limiting examples of intensity profiles include aGaussian distribution, a donut-shaped distribution, a half-dome orsemi-circular distribution, or any of these passed through a spatialstep filter, among others.

Used herein, “uniform intensity distribution” means less than 2%variation in intensity measured from the maximum intensity throughoutthe spot profile as received by the photo-curable layer 16.

A translator (not shown) may be coupled to the source 12 to direct thesource along the path 14 to trace a waveguide 26 (e.g., the waveguidecore) in the photo-curable layer 16 with the laser beam 20. In someembodiments, the translator moves the source 12 in a plane parallel tothe surface of the photo-curable layer 16. In many embodiments, thetranslator is a two-dimensional translator capable of tracing linear andnon-linear paths to enable the formation of linear and non-linearsegments of the waveguide 26. In one embodiment, the translator iscapable of rotating the laser beam 20 to align the laser beam spotprofile 22, 24 to the waveguide being traced.

In various embodiments, the convolution compensator 18 modifies anintensity profile, a shape of the spot profile 22, or both. In someembodiments, the convolution compensator 18 modifies at least a portionof the laser beam 20 based on at least one geometric property of awaveguide 26 desired to be written. As described herein in more detail,when the photo-curable layer 16 is cured by the laser beam 20, the LDWsystem 10 is capable of directing a consistent total amount of energyonto the photo-curable layer 16 while tracing and curing the waveguide26, in other words compensating for exposure convolution.

In at least one embodiment, the resulting waveguide 26 formed by LDWsystem 10 has a consistent waveguide cure profile along a length of thewaveguide having multiple waveguide segments, even for segments inseries having different bend radii. In at least some embodiments, theresulting waveguide 26 formed by LDW system 10 has a uniform waveguidecure profile along the length of each waveguide segment, whether linearor non-linear.

FIG. 2 is a schematic time-lapse representation of a process 30 to forma waveguide 126 with a waveguide LDW system, such as system 10 (FIG. 1).In the illustrated embodiment, the process 30 begins with tracing a path14, 14′ with a laser beam spot profile 22 at a constant speed over asurface of a photo-curable layer to selectively cure waveguide 126. Thelaser beam cures a first segment 28 and then a second segment 35 withthe same spot profile 22 for both segments. As shown, the spot profile22 is not modified by the convolution compensator 18 (FIG. 1) betweenthe first segment 28 and the second segment 35 to compensate fordifferences in geometry. As a result, the second segment 35 has aweighted, asymmetric cure profile and cross-sectional height profile(e.g., similar to cross-sectional shape indicated by top surface 530 ofFIG. 6) different than the first segment 28.

The first segment 28 is a linear waveguide segment defining a lateralwidth 50. The second segment 35 is a non-linear waveguide segmentdefining a lateral width 55. As shown, the non-linear second segment 35forms a bend. The non-linear second segment 35 defines an outer edge 40and an inner edge 45 separated by the width 55. The inner edge 45 is onthe inner side of the bend opposite the outer edge 40 on the outer side.

As illustrated, the widths 50, 55 are the same and consistent throughoutthe length of each respective segment. In other embodiments (not shown),the widths may be different between the segments, throughout a segment,or both.

The first segment 28 and the second segment 35 each have a differentbend radius. As shown, the bend radius for the first segment 28 isinfinite, which forms a linear segment. On the other hand, thenon-linear second segment 35 has at least one bend radius that isfinite.

In the illustrated embodiment, the non-linear portion of the path 14′comprises a single bend radius segment. However, the non-linear portionof the path 14′ may have a plurality of bend radii, such as a gradedbend segment described herein elsewhere.

Bend radii for a segment are defined between an origin point outside ofthe segment and a corresponding line parallel to the non-linear portionof the path 14′. Because each segment has a width 55, a segment willdefine more than one bend radius and will comprise a range of bend radiibounded by the bend radius R1 and the bend radius R3. As illustrated,the first radius R1 is defined from an origin point to a line along theinner edge 45, the second radius R2 is defined from the same originpoint to a line following the path 14′ along the center of the width 55,and the third radius R3 is defined from the same origin point to a linealong the outer edge 40. In the illustrated embodiment, radii R1 and R3are offset by half of the width 55 of the segment 35 from R2. As usedherein, bend radius 60 refers to the radius R2 along the path 14′ at thecenter of the width.

The process 30 forms the first and second segments 28, 35 in a seriesarrangement. As shown, the laser beam with spot profile 22 traces andcures the linear first segment 28 and thereafter traces and cures thenon-linear second segment 35. In other words the segments 28, 35 arearranged adjacent to, contiguous with, or essentially continuousend-to-end to each other. In other embodiments (not shown), the segmentsmay not be adjacent, may be formed in different order, or both.

The spot profile 22 may be of any suitable shape described herein inmore detail with respect to FIG. 10. In the illustrated embodiment, thelaser beam spot profile 22 defines a circular shape and a uniformintensity profile. In other embodiments, the spot profile 22 defines anon-circular shape, a non-uniform intensity profile, or both.

When the writing process 30 translates the laser beam with this spotprofile 22 at a constant speed along the linear and non-linear portionsof the path 14, 14′, a consistent total energy amount is delivered viaexposure convolution along the path 14, 14′ over the first segment 28.As a result, the linear first segment 28 has a symmetric first cureprofile throughout the length of the segment along the waveguidepropagation direction and throughout the width of the segment transverseto the waveguide propagation direction.

On the other hand, the non-linear second segment 35 has an asymmetricsecond cure profile different than the first cure profile. As shown, thecure profile for the second segment 35 defines an increasing curegradient along the width 55 from the outer edge 40 to the inner edge 45.In other words, the second cure profile is weight-shifted, or has acenter of gravity that is shifted, closer to the inner edge 45, becausedifferent portions of the laser beam travel at different angular speeds65 depending on the distance to the origin point (e.g., bend radius). Asshown, a portion of the laser beam directed nearer the outer edge 40moves more quickly than a portion of the laser beam directed nearer theinner edge 45. Thus, an uneven total energy amount is delivered viaexposure convolution to the non-linear second segment 35, at least alongthe width 55.

The cure profile of the first segment 28 is different than the cureprofile of the second segment 35, which has bend radius 60 differentthan the bend radius of the first segment 28. In many cases, theinconsistency between cure profiles may contribute to optical losses dueto refractive index mismatching during propagation, particularly betweensegments having different bend radii and in segments having a bend radiiless than the critical bend radius.

FIGS. 3A and 3B are schematic diagrams of an exemplary laser beam 120with a uniform spot profile 22 and an exemplary convolution compensator118 in position to modify the beam of corresponding cross-sectionalprofiles 22, 182, 124. As illustrated, the laser beam 120 includes afirst portion 21 having spot profile 22, which is directed into theconvolution compensator 118. The laser beam 120 is passed through theconvolution compensator 118 and at least a portion 123 of the laser beamis modified into modified spot profile 124.

A user may determine desired or target curing profiles for the waveguidefor fabrication with the dynamically reconfigurable convolutioncompensator 118. In response, the intensity profile can be selectivelymodified. As illustrated, the spot profile 22 has a circular shapeprofile and a uniform intensity profile, although other shape orintensity profiles may be used (e.g., rounded rectangle). Theconvolution compensator 118 modifies the laser beam 120 to address anyundesired effects of exposure convolution in response to a geometriccharacteristic, a laser beam spot profile characteristic, or both, forexample. In many embodiments, the laser beam 120 is modified in responseto at least one geometric property of the waveguide segment to bewritten, such as the bend radius of the segment, the width of thesegment, the trace speed, the intensity of the laser beam, and the shapeof the spot profile, among others. In some embodiments, the laser beam120 is modified in response to at least one characteristic of the laserbeam spot profile, such as a width of the spot profile, a shape profilealong the width, and an intensity profile along the width, among others.

At trace speed, the convolution compensator 118 is operable to modifythe laser beam 120 as needed in “real time” during a waveguide writingprocess, for example from the bend radius of the first segment 28 to thebend radius 60 of the second segment 35. In many embodiments, theconvolution compensator 118 is operable to modify the laser beam 120 in“real time” for graded bend segments having multiple incrementalwaveguide segments that are each a fraction of the total length of thegraded bend segment and require a different beam modification for eachincremental segment. As used herein, “real time” relates to the operablespeed and responsiveness of the LDW system being sufficient tocompensate for exposure convolution at trace speed.

The speed of translation in the waveguide writing process depends onmany factors to fabricate a desirable waveguide. In an exemplaryembodiment, the trace speed of the beam spot is about 8 mm/s to about 12mm/s. In other embodiments, the trace speed is less than about 8 mm/sor, alternatively, greater than about 12 mm/s. The trace speed may alsovary during the waveguide writing process depending on the desiredcharacteristics of the waveguide.

In many embodiments, the convolution compensator 118 is further operableto dynamically modify the laser beam 120 to write segments havingdifferent bend radii for a continuous waveguide. In various embodiments,the laser beam 120 with the modified intensity profile 124 is directedonto a photo-curable layer to write a non-linear waveguide segment basedon at least the bend radius of the segment.

In some cases, the resulting non-linear waveguide segment has asymmetric cure profile. In various cases, the non-linear waveguide has acure profile that substantially matches the cure profile of the linearwaveguide segment written with the laser beam 120 having the spotprofile 22. In many embodiments, when cure profiles have beensubstantially matched, the resulting waveguide segments exhibitsubstantially matching heights, refractive index profiles, or otherwaveguide segment characteristics.

Used herein, “substantially matching cure profiles” means less thanabout 2% variation in the amount of curing energy delivered to acorresponding point along the cross-sectional width of each wavy guidesegment being written.

In the illustrated embodiment, the modified intensity spot profile 124is a simple linear gradient from an outer side 140 to an opposing innerside 145 suited for writing a single-bend radius, non-linear waveguidesegment wherein the outer side 140 passes more quickly over aphoto-curable layer than the inner side 145 while tracing. In otherwords, the convolution compensator 118 applies a decreasing intensitygradient from the outer side 140 to the inner side 145 to the intensityprofile to modify spot profile 22 into modified spot profile 124.

The exemplary convolution compensator 118 includes a reconfigurablefilter 180 operable to modify the intensity profile of the laser beamspot profile 22. The filter 180 may be configured by a user to beresponsive to transitions between segments having different geometricproperties, such as different bend radii, during an LDW writing process.

Various embodiments comprise a reconfigurable filter 180 capable oftransitioning gradually from one graded density profile 182. In anexample embodiment, the reconfigurable filter 180 comprises a liquidcrystal array capable of being reconfigured continuously fromprofile-to-profile. In other various embodiments, the reconfigurablefilter 180 is capable of being reconfigured discretely fromprofile-to-profile marked by more abrupt transitions between profiles.However, it is to be understood that in some cases a plurality ofintermediate profiles may be used such that each individual discretetransition is small enough to be considered continuous for purposes ofthe laser direct writing particular application.

In some embodiments, the reconfigurable filter 180 is a neutral densityfilter. In various embodiments, the neutral density filter has a gradeddensity profile 182 from one end to an opposite end to modify the laserbeam 120 from a uniform spot profile 22 to the graded intensity profile124. However, any suitable gradient profile capable of compensating forexposure convolution may be used. In one embodiment, the graded densityprofile 180 decreases in the direction that the intensity gradient ofthe modified intensity profile 124 increases.

In another example embodiment, the reconfigurable filter 180 isreconfigured by swapping neutral density filters with different densitygradients corresponding to different bend radii. In one embodiment, thereconfigurable filter 180 swaps out all neutral density filters enablingthe convolution compensator 118 to selectively modify or not modify thelaser beam 120.

In some embodiments, as the writing process transitions between writinga first waveguide segment and writing a second waveguide segment havingdifferent bend radii, the convolution compensator 118 concurrentlytransitions from one configuration to another configuration while thelaser beam 120 continues to move at a constant speed. In some cases, theconvolution compensator 118 gradually modifies the laser beam 120between the bend radii in a continuous manner, for example, utilizing areconfigurable filter 180 capable of transitioning gradually fromprofile-to-profile.

In other cases, wherein the convolution compensator 118 uses discretestates (e.g., not continuous, such as physically swapping filters), thewaveguide may include a transition waveguide segment 125 (FIG. 4)between the first and second waveguide segments described herein in moredetail.

FIG. 4 is a schematic time-lapse representation of an exemplary process130 to form a consistent waveguide 226 with a symmetric cure profile foruse with a convolution compensator (e.g., 118 of FIG. 3A) and a uniformlaser beam spot profile 22. Many elements shown in FIG. 4 are the sameelements shown in FIG. 2 and are numbered the same.

In the illustrated embodiment, the process 130 begins with tracing thepath with a laser beam spot profile 22 at a constant speed over asurface of a photo-curable layer to selectively cure waveguide 226. Thelaser beam with spot profile 22 cures a first segment 28 having width50. Then, the laser beam with modified spot profiles 124, 124′, 124″different than spot profile 22 cures a second segment 135 having outeredge 40 and inner edge 45 separated by width 55.

As illustrated, the modified spot profiles 124, 124′, 124″ have the sameintensity and shape profiles. In many embodiments, the profiles are thesame when the second segment 135 has a single bend radius. In otherembodiments, the modified spot profiles 124, 124′, 124″ are eachdifferent, for example, when the second segment 135 is a graded bendsegment defined by multiple incremental segments and corresponding bendradii. Each spot profile depends on the corresponding bend radius.

The second segment 135 has a different bend radius than the firstsegment 28. As shown, the second segment 135 is non-linear in the formof a bend defined by bend radius 60, so portions of the laser beamtravel at different speeds 65 (e.g., more quickly over the outer edgesegment portions than the inner edge segment portions).

The modified spot profile 124 compensates for exposure convolution whiletracing based on at least one geometric property of the second segment135, such as the bend radius 60. As shown, the modified spot profile 124includes a non-uniform intensity profile that increases from one sidedirected at inner edge segment portions to an opposing side directed atouter edge segment portions. The shape of the modified spot profile 124retains a circular shape.

As a result of the process 130, the second segment 135 has a cureprofile that is desired and substantially matches the cure profile ofthe first segment 28, which is symmetric and may improve optical lossesin the waveguide 226 relative to waveguide 126 (FIG. 2). In someembodiments, the waveguide 226 may include a transition waveguidesegment 125 between the first and second segments 28, 135.

In various embodiments, the transition waveguide segment 125 is formedby a non-continuous or discrete modification of the laser beam used tocure the waveguide. Generally, the longer the transition time ordistance between configurations of the convolution compensator, thelonger the transition waveguide segment 125 will be.

In many embodiments, the transition waveguide segment 125 has a linearlength or arc length that is less than 10%, less than 5%, less than 1%,less than 0.5%, or less than 0.1% of the length of the first or secondwaveguide segment.

In some embodiments, the characteristics of the transition waveguidesegment 125, including physical dimensions, do not substantially impactthe performance of the waveguide between the first and second waveguidesegments. For example, the transition waveguide segment 125 may have asufficiently short length or sufficiently small variation from the firstand second segments 28, 135.

A waveguide, such as exemplary waveguide 500 having aconvolution-compensated cure profile is shown in FIGS. 5-6, may beformed at least partly by process 130, or any other process describedherein. The waveguide 500 may be utilized in an optical board, such asexemplary optical board 600 in FIG. 5. In turn, the optical board may beutilized to form optical circuits or assemblies for variousapplications. In particular, FIG. 5 shows a plan view of the opticalboard 600 showing the waveguide 500 extending from one edge to anotheredge of the board in a schematic representation. Alternatively, FIG. 5can be described as a partial view of an optical portion of a board 600showing only a portion of a waveguide 500, and the board 600 may includeother waveguides or even non-optical components (e.g., electrical orelectronic). From an elevation viewpoint, FIG. 6 shows the waveguide 500along a cross-section 502.

In the illustrated embodiment, the waveguide 500 extends through theoptical board 600 and includes a first segment having a first bendradius to a second segment having a second bend radius, similar to thewaveguide 226 shown in FIG. 4. In many embodiments, the cross-sectionalprofiles of the first and second segments may substantially matchcross-section 502 shown in FIG. 6.

As shown along cross-section 502, the waveguide 500 includes a waveguidecore 505, lower waveguide cladding 510, and upper waveguide cladding515. In an exemplary LDW process, a photo-curable layer may be disposedon the lower cladding 510 and selectively cured via writing to form thewaveguide core 505. The uncured portion of the photo-curable layer maybe removed. Then, the upper cladding 515 may be formed over thewaveguide core 505 to surround the core with cladding. The waveguidecore 505 defines a waveguide top or top surface 520 (e.g., uppersurface) and one or more waveguide sides 525, both being adjacent to theupper waveguide cladding 515. The waveguide 500 may be described as awritten waveguide.

In many embodiments, the waveguide core 505 has a different refractiveindex than the cladding 510, 515. As shown, the waveguide core 505 has auniform refractive index profile across its width.

In the embodiment shown, the top surface 520 of the core 505 may not besubstantially uniform in height. The top surface 520 may be described asnon-planar. Thus, the height may vary along the top surface 520 in anamount greater than or equal to about 0.1%, to about 1%, to about 10%,to about 25%, or to about 50% of the maximum height of the core 505. Invarious embodiments, the height varies along the top surface 520 in anamount preferably less than about 1%, less than about 5%, less thanabout 10%, or less than about 25% of the maximum height of the core 505.

In many illustrative embodiments, a written waveguide 500 may exhibitcharacteristic markers of laser writing, which may distinguish thewritten waveguide from a waveguide formed by photolithography.Non-limiting examples include markers related to cross-sectional shape,for example, some of which are described herein. In at least someillustrative embodiments, the top surface 520 may include a non-uniformheight portion and an optional uniform height portion. The non-uniformheight portion may be adjacent to a uniform height portion. Thenon-uniform height portion may be adjacent to a side of the core 505 ofthe waveguide (e.g., waveguide side(s) 525).

In the illustrated embodiment, the top surface 520 includes asubstantially uniform height center portion and two non-uniform heightouter portions, for example. The top surface 520 may define a maximumheight. In at least some illustrative embodiments, the top surface 520defines a maximum height toward the center of the cross-section, and thetop surface 520 reduces in height proximal, or adjacent, to the one ormore sides 525. The reduction in height may define a rounded edge, forexample. In other words, the top surface 520 may define a heightprofile, for the waveguide 500 or any segment of the waveguide, whichmay be described as extending along a width of the waveguide 500 or anysegment of the waveguide.

A convolution compensator, such as any described herein, may be utilizedto influence the cross-sectional shape of the waveguide 500. Forexample, the non-uniform portion, or reduction in height, may be theresult of curing with a laser beam having an intensity profile withhigher intensity toward the center of the profile and a lower intensitytoward the periphery. In at least one embodiment, the waveguide corelayer may have been cured with a laser beam spot profile having arounded rectangular shape profile (e.g., spot profile 650 of FIG. 11B)or a circular shape with modified intensity profile (e.g., spot profile600 of FIG. 11A). In alternative embodiments (not shown), the waveguidecore 505 has another non-linear shape, such as a half-dome or aGaussian-like curve, for example, which may be caused by curing with acircular laser beam spot profile (e.g., spot profile 22 of FIG. 3B).

In many illustrative embodiments, the waveguide sides 525 may indicate awritten waveguide versus a photolithography-formed waveguide. Forexample, the waveguide sides 525 may define a width. The width maydefine a width profile, which may be described as extending along aheight of the waveguide 500 or any segment of the waveguide. In manyembodiments, the width profile may be substantially uniform. In otherwords, the sides 525 may be substantially parallel. The parallel sidesmay be formed due to the collimated nature of the electromagneticradiation from a laser beam. This may differ from a waveguide formed byphotolithography, which may include sloped sides due to diffractioneffects of light passing a photolithography mask before being absorbedinto the photo-curable layer.

Used herein, “substantially parallel” means the variation in distancebetween the sides 505 along the height is less than about 0.1%, lessthan about 1%, or less than about 5% of a maximum width between thesides. In some cases, the maximum width is located at the base of thewaveguide core 505 adjacent to the lower cladding 510.

In some illustrative embodiments, a transition waveguide segment mayindicate a written waveguide, as described with respect to FIG. 4, forexample. The transition waveguide segment may be disposed between twomain segments (e.g., first segment 28 and second segment 135 of FIG. 4).Perhaps as best shown in FIG. 5, a transition waveguide segment may belocated in the waveguide 500 along a cross-section 504. The transitionwaveguide segment may include a non-uniform top or non-uniform topsurface 530 (e.g., upper surface) different than the uniform top surface520 of corresponding main segments. In other words, the cross-sectionalprofile of the transition waveguide segment may differ from thecross-sectional profile of the main segments, such as the first segmentor the second segment described herein elsewhere. This may differ from awaveguide formed by photolithography, which may utilize a substantiallystationary, uniform, and consistent light-source to cure thephoto-curable layer.

In the illustrated embodiment, the top surface 530 of the transitionwaveguide segment may resemble the top surface 520 modified by exposureconvolution or resemble an artifact of transitioning the convolutioncompensator, transitioning the path of the laser beam, or both, forexample. In many embodiments, the variation between the top surface ofthe transition waveguide segment and the top surfaces of the mainsegments is less than the variation would be between main segmentshaving different bend radii formed by LDW without convolutioncompensation, which may be beneficial to improve optical loss.

An exemplary waveguide may be formed utilizing process 230. As shown inFIG. 7, a schematic time-lapse representation of an exemplary process230 may form a consistent waveguide 326 with a non-uniform cure profileusing the exemplary convolution compensator (e.g., 118 of FIG. 3A) and anon-uniform laser beam spot profile 222. Many elements shown are thesame elements shown in FIG. 4 and are numbered the same. However, FIG. 7differs in that the spot profile 222 used to cure the first segment 228of the waveguide 326 has a non-uniform intensity profile, which is thenmodified by a convolution compensator to cure the second segment 235.Although the spot profile 222 is not uniform, the convolutioncompensation steps are the same as used in process 130.

As shown, the spot profile 222 is circular and has a Gaussian intensityprofile decreasing in intensity from the center of the circle toward theperimeter. In some cases, the Gaussian intensity profile may bebeneficial in forming a graded index polymer waveguide by LDW, such asin a photoaddressing process or others, which may improve modaldispersion and improve confinement of signal energy.

Exemplary process 230 begins with tracing the path with a laser beamspot profile 222 at a constant speed over a surface of a photo-curablelayer to selectively cure waveguide 326. The laser beam with spotprofile 222 cures a first segment 228 having width 50. Then, the laserbeam with modified spot profile 224 different than spot profile 222cures a second segment 235 having outer edge 40 and inner edge 45separated by width 55.

The second segment 235 has a different bend radius than the firstsegment 228. As shown, the second segment 235 is non-linear in the formof a bend defined by bend radius 60, so portions of the laser beamtravel at different speeds 65 (e.g., more quickly over the outer edgesegment portions than the inner edge segment portions).

The modified spot profile 224 compensates for exposure convolution whiletracing based on at least one geometric property of the second segment235, such as the bend radius 60. As shown, the modified spot profile 224includes a non-uniform intensity profile that resembles a gradedintensity profile that increases from one side directed at inner edgesegment portions to an opposing side directed at outer edge segmentportions, which is applied to the Gaussian intensity profile of spotprofile 222. The shape of the modified spot profile 224 retains acircular shape.

As a result of the process 230, the second segment 235 has a cureprofile that is desired and substantially matches the cure profile ofthe first segment 228, which has a Gaussian distribution along the width55 and may improve optical losses in the waveguide 326 relative towaveguide 126 (FIG. 2). In some embodiments, the waveguide 326 mayinclude a transition waveguide segment between the first and secondsegments 228, 235 similar to the transition waveguide segment 125described with respect to FIG. 4.

FIGS. 8A and 8B are schematic diagrams of an exemplary uniform laserbeam 320 and another exemplary convolution compensator 318 in positionto modify the beam and of corresponding cross-sectional profiles 22,192, 324. Convolution compensator 318 is similar to convolutioncompensator 118. However, the convolution compensator 318 is configuredto modify the shape of the spot profile 22, whereas the convolutioncompensator 118 of FIG. 3 is configured to modify the intensity profileof the spot profile 22.

In a manner similar to that described with respect to convolutioncompensator 118, a laser beam 320 includes a first portion 21 havingspot profile 22, which is directed into the convolution compensator 318and at least a portion 323 of the laser beam is modified to have amodified spot profile 324. However, the spot profile 22 may be modifiedfrom a circular shape into a different, non-circular shape, shown asmodified spot profile 324. In the illustrated embodiment, the modifiedshape of the spot profile 324 resembles a gradual taper that narrowsfrom an outer side 340 to an opposing inner side 345, which is appliedto the circular shape of the spot profile 22. In other words, theconvolution compensator 318 as illustrated applies a taper to the shapeof the spot profile 22.

The exemplary convolution compensator 318 includes an adaptive lens 190having a cross-sectional area 192 larger than the spot profile 22 andoperable to modify the shape of the laser beam spot profile 22. The lens190 may be configured by a user to be responsive to transitions betweensegments having different geometric properties, such as different bendradii, during an LDW writing process. In some embodiments, the adaptivelens 190 is an optofluidic lens. However, any suitable beamforming lenscapable of compensating for exposure convolution may be used.

In various embodiments, the adaptive lens 190 is adaptable to variouswaveguide segment geometries by applying any number of electricalsignals to the lens. The electrical signals may be continuously variableor discrete, for example. In one embodiment, the adaptive lens 190 isadaptable to pass a laser beam without reshaping the spot profile 22,enabling the convolution compensator 318 to selectively modify or notmodify the laser beam 320.

In some embodiments, the transition of the convolution compensator 318is discrete and not continuous from state-to-state and may result in theformation of a transition waveguide segment similar to transitionwaveguide segment 125 (FIG. 4).

FIGS. 9A and 9B are a schematic diagrams of an exemplary uniform laserbeam 420 and a further exemplary convolution compensator 418 in positionto modify the beam and of corresponding cross-sectional profiles 22,482, 492, 424. Similar to FIGS. 3A and 3B and 8A and 8B, a laser beam420 includes a first portion 21 having spot profile 22, which isdirected into the convolution compensator 418 and at least a portion 423of the laser beam is modified to have a modified spot profile 424.However, the convolution compensator 418 is capable of modifying theintensity profile, the shape, or both of the spot profile 22 in a mannersimilar to those described with respect to convolution compensators 118and 318.

In the illustrated embodiment, the shape profile of the modified spotprofile 424 resembles a gradual taper that narrows from an outer side440 to an opposing inner side 445, which is applied to the circularshape of the spot profile 22 being modified to have a graded intensityprofile. In other words, the convolution compensator 418 applies a taperand an intensity gradient to spot profile 22.

In various embodiments, the convolution compensator 418 provides amodified spot profile 424 that is narrower at the inner side 445 thanouter side 440 but does not resemble the shape profile of spot profile22. In one example, the convolution compensator 418 modifies a circularshape to a rounded trapezoid shape. In another example, the convolutioncompensator 418 modifies a rounded rectangle to a rotated, roundedrectangle.

In some embodiments, the convolution compensator 418 includes areconfigurable filter 480 having a graded density profile 482 (similarto reconfigurable filter 180 and profile 182) and an adaptive lens 490having a cross-sectional area 492 (similar to adaptive lens 190 and area192). Utilizing both the filter 480 and the lens 490 can increase theflexibility and performance of the convolution compensator 418. In oneexample, the convolution compensator 418 is capable of compensating foreven smaller bend radii or more rapid changes in bend radii (e.g.,quicker transitions) than a convolution compensator having only one ofthe filter 480 and the lens 490.

The convolution compensator 418 can selectively modify the intensityprofile, the shape, or a combination thereof. Such modifications canalso be concurrent, staggered, or a combination thereof. In oneembodiment, the convolution compensator 418 cooperatively applies filter480 to modify the intensity profile and applies the lens 490 to modifythe shape of the spot profile 22.

In one example, the transition of the filter 480, the lens 490, or bothis discrete and not continuous from state-to-state and may result in theformation of a transition waveguide segment similar to transitionwaveguide segment 125 (FIG. 4). However, the convolution compensator 418may transition more gradually between segments by staggering thetransition of the filter 480 and the lens 490 for example.

In another example, the graded density profile 482 can be lessaccentuated than the graded density profile 182 (FIG. 3B) to achieve thesame exposure convolution compensation by concurrently applying a taperwith lens 490 to the spot profile 22, which itself can be lessaccentuated than the taper provided by the adaptive lens 190 (FIG. 8A)to achieve the equivalent convolution compensation.

An exemplary waveguide may also be formed utilizing process 430. Asshown in FIG. 10, a schematic time-lapse representation of an exemplaryprocess 430 may form a consistent waveguide 426 with a uniform cureprofile using a convolution compensator (e.g., 418) and a uniform laserbeam spot profile 22′ having a rounded rectangular shape. Many elementsshown are the same elements shown in FIGS. 4 and 7 and are numbered thesame.

In the illustrated embodiment, the process 430 begins with tracing thepath with a laser beam spot profile 22′ at a constant speed over asurface of a photo-curable layer to selectively cure waveguide 426. Thelaser beam with spot profile 22′ cures a first segment 28 having width50. Then, the laser beam with a modified spot profile 424, 424′, 424″different than spot profile 22′ cures a second segment 135 having outeredge 40 and inner edge 45 separated by width 55. Both the first segment28 and the second segment 135 have substantially uniform cure profiles.

As can be seen, the spot profile 22′ has a rounded-rectangular shapeprofile, which may have been modified by a convolution compensator froma circular shape profile to compensate for exposure convolution duringtracing based on the shape or intensity of the laser beam spot profile.In the illustrated embodiment, the initial modified spot profile 424 isrotated one or more times as illustrated by modified spot profiles 424′and 424″ while tracing the second segment 135. In many embodiments, themodified spot profile 424 is rotated by a translator. In otherembodiments, the modified spot profile 424 is apparently rotated by aconvolution compensator by modifying the shape profile to simulaterotation by the translator.

As shown, the second segment 135 has a different bend radius than thefirst segment 28. As shown, the second segment 135 is non-linear in theform of a bend defined by bend radius 60, so portions of the laser beamtravel at different speeds 65 (e.g., more quickly over the outer edgesegment portions than the inner edge segment portions).

The modified spot profile 424 compensates for exposure convolution whiletracing based on at least one geometric property of the second segment135, such as the bend radius 60. As shown, the modified spot profile 424defines a non-uniform intensity profile that decreases from the firstside to the opposing second side and has a modified shape profile thatresembles a gradual taper applied to the rounded-rectangular spotprofile 22′ that narrows from the first side to the opposing secondside.

As a result of the process 430, the second segment 135 has a cureprofile that is desired and substantially matches the cure profile ofthe first segment 28, which is uniform and may improve optical losses inthe waveguide 426 relative to waveguide 126 (FIG. 2). In someembodiments, the waveguide 426 may include a transition waveguidesegment between the first and second segments 28, 135 similar to thetransition waveguide segment 125 described with respect to FIG. 4, whichmay have more gradual transitions than transition waveguide segment 125.

FIGS. 11A, 11B, 11C, and 11D are schematic representations of exemplarylaser beam spot profiles. In some embodiments, the spot profiles 600,650, 655, 660 represent spot profiles of a laser beam modified by aconvolution compensator capable of modifying the intensity profile, theshape profile, or both to achieve a substantially uniform cure profilewhen writing a waveguide. In other embodiments, the spot profiles 600,650, 655, 660 represent the beam cross-sectional profile prior tomodification by a convolution compensator. In yet further embodiments,each of the spot profiles 600, 650, 655, 660 may be further modified bya convolution compensator, for example, to move from writing a linearwaveguide segment to a non-linear waveguide segment or vice versa.

As used herein, “substantially uniform cure profile” means less thanabout 2% variation in the amount of curing energy delivered along thecross-sectional width of the waveguide segment being written.

Intensity profiles may be uniform or uneven, such as a gradient.Non-limiting examples of spot profile shapes include: a closed conicsection, an oval, a polygon, any rounded corner versions thereof, anysymmetric versions thereof, any asymmetric versions thereof, anycombination of linear or non-linear lines to form an outer perimeter,any tapered versions thereof, any rotations thereof, or any combinationsthereof. A polygon may be a triangle, a quadrilateral, a pentagon, ahexagon, and so forth. A symmetric version of a quadrilateral may be asquare or a rectangle, for example, whereas an asymmetric version may bea trapezoid. An example of a symmetric version of a closed conic sectionmay be a circle or an ellipse.

As illustrated, spot profile 600 includes a width 605 extending from afirst side or outer side 610 to a second or inner side 615 opposite thefirst side, and a central portion 620 between a first outer portion 625and a second outer portion 630 opposite the first outer portion. Theshape profile is variable along the width (e.g., uneven or non-uniform),and the intensity profile is a variable gradient across the width. Forexample, the circular shape has less area in each outer portion per unitwidth than in the central portion (e.g., uneven across the width inarea), which would result in an uneven cure profile due to the shapealone. However, the intensity of the central portion 620 is less thanthe intensity of the outer portions 625, 630, which compensates for theeffects of the variable shape profile. Thus, in some cases, the spotprofile 600 is useful to trace a linear waveguide segment, wherein thevariable shape and intensity profiles balance along the width 605 toaddress the effects of exposure convolution and produce a substantiallyuniform cure profile.

Turning to spot profile 650, the shape profile is a rounded rectangle,similar to spot profile 22′ (FIG. 10). The shape profile of a rectangleis more uniform or even along the width (e.g., less variable) than theother spot profile 600 and may be substantially uniform. In addition,the intensity gradient is more uniform than the other spot profile 600and may be substantially uniform. Similar to spot profile 600, the spotprofile 650 may be useful to trace a linear waveguide segment whereinthe substantially uniform shape and intensity profiles balance along thewidth to address the effects of exposure convolution and produce asubstantially uniform cure profile.

Referring now to spot profile 655, the shape profile is a roundedrectangle, similar to the other spot profile 650, which would result inan uneven cure profile for a non-linear waveguide segment. However, theintensity gradient is more uneven than spot profile 650. As shown, theintensity gradient is higher in a first outer portion than the centralportion and higher in the central portion than a second outer portionopposite the first outer portion. In contrast to the other spot profiles600, 650, the spot profile 655 may be useful to trace a non-linearwaveguide segment, wherein the substantially uniform shape profile andvariable intensity profile balance along the width to address theeffects of exposure convolution and produce a substantially uniform cureprofile.

With regard to spot profile 660, the intensity gradient is substantiallyuniform along the width similar to spot profile 650. However, the shapeprofile is variable. As shown, the shape profile is a tapered, roundedrectangle (e.g., a rounded trapezoid) resembling a taper applied to spotprofile 650 narrowing from an outer side to an inner side opposite theinner side. Similar to the spot profile 655, the spot profile 660 may beuseful to trace a non-linear waveguide segment, wherein the variableuniform shape profile and substantially uniform intensity profilebalance along the width to address the effects of exposure convolutionand produce a substantially uniform cure profile.

In many embodiments, a convolution compensator is capable of modifyingthe shape or intensity of any laser beam spot profile into another laserbeam spot profile according to a characteristic of the cross-sectionalprofile (e.g., width, shape profile, or intensity profile), acharacteristic of a waveguide segment (e.g., waveguide width or a bendradius of the current, previous, or subsequent waveguide segment to bewritten), or any combination thereof. In one example, a convolutioncompensator modifies a slightly Gaussian, circular laser beamcross-sectional profile (e.g., variable shape profile and slightlyvariable intensity profile) into spot profile 650 to trace a linearwaveguide segment. To trace a subsequent non-linear waveguide segment,the convolution compensator modifies the spot profile 650 into spotprofile 660 to compensate for exposure convolution caused by differingben radii between the linear and non-linear waveguide segments.

Unless otherwise indicated, all numbers expressing feature sizes,amounts, and physical properties used in the specification and claimsare to be understood as being modified in all instances by the term“about.” Accordingly, unless indicated to the contrary, the numericalparameters set forth in the foregoing specification and attached claimsare approximations that can vary depending upon the desired propertiessought to be obtained by those skilled in the art utilizing theteachings disclosed herein.

The recitation of numerical ranges by endpoints includes all numberssubsumed within that range (e.g. 1 to 5 includes 1, 1.5, 2, 2.75, 3,3.80, 4, and 5) and any range within that range.

As used in this specification and the appended claims, the singularforms “a”, “an”, and “the” encompass embodiments having pluralreferents, unless the content clearly dictates otherwise. As used inthis specification and the appended claims, the term “or” is generallyemployed in its sense including “and/or” unless the content clearlydictates otherwise.

It is noted that terms such as “top”, “bottom”, “above, “below”, etc.may be used in this disclosure. These terms should not be construed aslimiting the position or orientation of a structure, but should be usedas providing spatial relationship between the structures.

Embodiments of the a method, system, and apparatus for modifying thelaser beam spot profile used to trace and cure the waveguide to providea uniform cure profile are disclosed. The implementations describedabove and other implementations are within the scope of the followingclaims. One skilled in the art will appreciate that the presentdisclosure can be practiced with embodiments other than those disclosed.The disclosed embodiments are presented for purposes of illustration andnot limitation, and the present invention is limited only by the claimsthat follow.

What is claimed is:
 1. A method comprising: tracing a waveguide segmentin a photo-curable layer with a laser beam, the laser beam defining anon-uniform spot profile having at least one of a variable intensityprofile and a variable width shape profile; passing the laser beamthrough a convolution compensator configured to dynamically modify atleast a portion of the laser beam in response to at least one of thevariable intensity profile and the variable width shape profile of thenon-uniform spot profile to define a modified beam portion of the laserbeam and a modified spot profile different than the spot profile; andcuring the photo-curable layer along the waveguide segment with themodified beam portion of the laser beam having the modified spotprofile.
 2. The method of claim 1, wherein the modified spot profilecompensates for exposure convolution during the tracing step and curingresults in a waveguide segment having a substantially uniform cureprofile.
 3. The method of claim 1, comprising: tracing a linearwaveguide segment in the photo-curable layer with the laser beam; andcuring the photo-curable layer along the linear waveguide segment withthe modified beam portion of the laser beam having the modified spotprofile.
 4. The method of claim 1, comprising: tracing a non-linearwaveguide segment in the photo-curable layer with the laser beam; andcuring the photo-curable layer along the linear waveguide segment withthe modified beam portion of the laser beam having the modified spotprofile.
 5. The method of claim 1, comprising modifying the spot profilewith the convolution compensator to modify at least one of: the variableintensity profile with a reconfigurable filter of the convolutioncompensator; and the variable width shape profile with an adaptive lensof the convolution compensator.
 6. The method of claim 5, comprisingcooperatively modifying both the variable intensity profile and thevariable width shape profile.
 7. The method of claim 1, wherein themodified spot profile defines a modified intensity profile thatdecreases intensity from at least one outer portion to a central portionalong a spot profile width.
 8. The method of claim 1, wherein thevariable width shape profile of an unmodified portion of the laser beamhas a first width variation, wherein the modified spot profile of themodified portion of the laser beam defines a modified width shapeprofile having a second width variation less than the first widthvariation.
 9. The method of claim 1, wherein the modified laser beamspot profile defines a rounded polygonal shape profile.
 10. The methodof claim 1, comprising: tracing a transition waveguide segment adjacentto the waveguide segment defining a different cross-sectional geometricheight profile than a cross-sectional geometric height profile of thewaveguide segment.
 11. A method comprising: tracing a waveguide segmentin a photo-curable layer with a laser beam, the laser beam defining anon-uniform spot profile having at least one of a variable intensityprofile and a variable width shape profile, the waveguide segmentdefining a first bend radius; passing the laser beam through aconvolution compensator to modify at least a portion of the laser beamin response to at least one of the variable intensity profile and thevariable width shape profile of the non-uniform spot profile to define amodified beam portion of the laser beam and a modified spot profiledifferent than the spot profile; curing the photo-curable layer alongthe waveguide segment with the modified beam portion of the laser beamhaving the modified spot profile; tracing another waveguide segmentdefining a second bend radius with the laser beam, wherein the secondbend radius is different than the first bend radius; passing the laserbeam through the convolution compensator to modify at least a portion ofthe laser beam in response to at least one of an intensity profile, ashape profile of the non-uniform spot profile, and the second bendradius to define another modified beam portion of the laser beam andanother modified spot profile different than the spot profile; andcuring the photo-curable layer along the waveguide segment with theanother modified beam portion of the laser beam having the anothermodified spot profile.
 12. The method of claim 11, comprising: tracing atransition waveguide segment disposed between the waveguide segment andthe another waveguide segment defining a different cross-sectionalgeometric height profile than cross-sectional geometric height profilesof the waveguide segment and the another waveguide segment.
 13. Themethod of claim 11, wherein a second substantially uniform cure profileof the another waveguide segment substantially matches a substantiallyuniform cure profile of the waveguide segment.
 14. A method comprising:tracing a waveguide segment in a photo-curable layer with a laser beam,the laser beam defining a non-uniform spot profile having at least oneof a variable intensity profile and a variable width shape profile;passing the laser beam through a convolution compensator configured todynamically modify at least a portion of the laser beam in response toat least one of the variable intensity profile and the variable widthshape profile of the non-uniform spot profile to define a modified beamportion of the laser beam and a modified spot profile different than thespot profile; and curing the photo-curable layer along the waveguidesegment with the modified beam portion of the laser beam having themodified spot profile, wherein a cross-sectional geometric heightprofile of the waveguide segment comprises a non-uniform height portiondefining a rounded edge.
 15. The method of claim 14, wherein thecross-sectional geometric height profile of the waveguide segmentcomprises a uniform height portion adjacent to the non-uniform heightportion.
 16. The method of claim 14, wherein the waveguide segmentdefines segment width between segment sides of a cross-section of thewaveguide segment and extending parallel to a linear base edge of thewaveguide segment, wherein the segment sides are substantially parallel.17. The method of claim 16, wherein the segment sides define a variationin distance less than or equal to 5% of a maximum width between thesegment sides.
 18. The method of claim 16, wherein the cross-sectionalgeometric height profile reduces in height adjacent to the segmentsides.
 19. The method of claim 16, wherein the cross-sectional geometricheight profile defines two non-uniform height portions each adjacent toa different segment side.
 20. The method of claim 16, wherein thecross-sectional geometric height profile defines a maximum height towarda center of the profile.